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网站首页 >> TEM SEM EDS XRD耗材 >> 扫描电镜专用衬底

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美国进口V1等级云母片

扫描电镜专用衬底

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基底材料是用于SEM，AFM，X射线分析，电子探针显微镜等设备表征时的样品提供各种类型的衬底。随着各种制备手段的提高，基底材料的特性将很大程度上影响材料的生长过程。基底材料的特有属性（如光、电、磁等属性）也会影响到样品的表征。所以选择正确的基底对样品的制备过程与表征结果有重要的意义。 原装进口 V1级（最高等级）云母片,透明，坚硬，色泽均匀，具有高平整性，无污渍、无外来夹杂物、裂纹和其他类似的缺陷。 圆形云母片用于碳支撑膜生产和薄膜镀覆研究，云母还用作TEM表征样品的基底。 适合为高分辨率的原子力显微镜（AFM)进行研究，如DNA，DNA-蛋白和薄膜基板。 Freshly cleaved muscovite mica surfaces have an outstanding even surface, are optically flat, clear, transparent, scratchless and free from fingerprints. They are very useful in electron microscopy for production of carbon support films, particle imaging, cell growing and thin film coating research. Muscovite mica surface are also suitable as substrates for high resolution atomic force microcopy studies such as DNA, DNA-protein and thin films.Cleaving mica involves insertion of a sharp edge or point into an edge or corner of the sheet and gently prying apart the leaves. A good sharp razor blade edge will do the job and in some cases a sharp pointed tweezer may accomplish this.. The freshly exposed micro surface should be used immediately after cleaving to take advantage of the clean and even surface. The muscovite mica is die cut to the sizes offered. The thickness of the mica sheets varies between 0.18 - 0.25mm (0.007 - 0.01") which yields much thinner, uniform sheets.Cleaving can also be achieved by placing a double coated piece of tape onto the mica surface and gently pulling off the mica layer starting on one edge of the mica. Then place mica with tape side down on to a specimen disc or mount. Muscovite mica cleaves on the {001} plane. Ruby muscovite color ranges from almost white through pink to a light ruby and into shades of brownish ruby and brown. It is considered of higher quality (compared to green muscovite) because of hardness and excellent cleavage properties permitting it to be split into the thinnest desired film without the risk of cracking. It is optically flat, resilient and incompressible. While it splits into thin films along its cleavage planes, it remains tough and elastic, even at high temperatures. Chemically, mica is a complex hydrous silicate of aluminum, containing potassium, magnesium, iron, sodium fluoride and/or lithium and traces of other elements. It is stable and inert to water, acids (except hydrofluoric and concentrated sulfuric acids), alkalis, conventional solvents and oil. Our mica has minimum inclusions, minimum air and bubbles and is clean. ASTM D-351 describes grading standards for mica. Mica Grades Mica grades from V-1 to V-5 with V-1 being the highest quality. V-1    Clear, hard, of uniform color, nearly flat, free from stains, foreign inclusions, cracks and other similar defects. V-2    Clear and slightly stained. May contain slight crystallographic discoloration and very slight air inclusions in one fourth of the usable area. V-3    Fair stained. Hard, of uniform color, may contain slight waves, slight crystallographic discoloration, and medium air inclusions in not more than one half of the usable area. V-4    Good stained. Hard, of uniform color, may contain medium waves. Slight crystallographic discoloration and medium air inclusions in not more than two thirds of the usable area. V-5    Stained A quality. Hard, may contain medium air inclusions, uniformly distributed in the usable area, slight green vegetable stains and medium waviness. AFM Mica Discs Highest quality grade V1 mica, 0.21mm (0.0085”) thick. Interleaved, in packages of 10. Can be mounted on AFM/STM discs. Available in four diameters: 10mm (0.39") 12mm (0.47") 15mm (0.59") 20mm (0.79")美国TED PELLA原装进口，正规渠道，有正规报关手续，必须时可以提供合法合规手续，诚信经营。高校、科研所实验室可以先送货，后公对公付款。 <img src="http://prof55eea.pic48.websiteonline.cn/upload/20200213_150431_104.jpg" width="750" height="750"/>
方片高纯单晶硅

扫描电镜专用衬底

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所发货硅片都是切割好的小方片，用蓝膜保护好的。高纯单晶抛光硅片，已激光划片，方便大小使用，小硅片尺寸是3、5、10、15、20、25、30、40、50mm的方片，硅片厚度550um-725um，有少量库存，其他尺寸的需要定制，请联系店家。可用于同步辐射样品载体、PVD/CVD镀膜衬底、磁控溅射生长样品、XRD、SEM等领域。生长方法     直拉单晶              抛光           单抛（抛光面有蓝膜保护）晶体取向    <100>电阻率        1-30工艺参数     平整度TIR<3μm、挠曲度ttv<10μm、弯曲度bow<10μm、粗糙度<0.5nm、颗粒度<10（for size="">0.3μm）加工定制    客户如果需要不同参数的硅片，请联系客服支付方式    公对公转账、院校合作、支付宝、货到付款、银行汇款 <img src="http://prof55eea.pic48.websiteonline.cn/upload/20200213_150053_100.jpg" width="750" height="750" style=""/><img src="http://prof55eea.pic48.websiteonline.cn/upload/20200213_150053_102.png" width="750" height="750" style=""/>
实验科研专用高纯度单晶硅片

扫描电镜专用衬底

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高纯单晶抛光硅片，已激光划片，方便大小使用，小硅片尺寸是3、5、10、15、20、25、30、40、50mm的方片，硅片厚度550um-725um，有少量库存，其他尺寸的需要定制，请联系店家。可用于同步辐射样品载体、PVD/CVD镀膜衬底、磁控溅射生长样品、XRD、SEM等领域。生长方法     直拉单晶                抛光           单抛（抛光面有蓝膜保护） 晶体取向     <100> 电阻率        1~30工艺参数     平整度TIR<3μm、挠曲度TTV<10μm、弯曲度BOW<10μm、粗糙度<0.5nm、颗粒度<10（for size>0.3μm） 加工定制    客户如果需要不同参数的硅片，请联系客服 <img src="http://prof55eea.pic48.websiteonline.cn/upload/20200213_145725_098.jpg" width="750" height="1000" style=""/><img src="http://prof55eea.pic48.websiteonline.cn/upload/20200213_145725_097.jpg" width="750" height="1000" style=""/><img src="http://prof55eea.pic48.websiteonline.cn/upload/20200213_145725_099.png" width="750" height="750" style=""/>

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